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to be used for the equipment control in flow shop type manufacturing line
SEMI D38-0211 (technical revision)
equipment recipes)
Therefore a standardized test method providing reproducible data for thickness and its variation is required to establish agreement between business partners regarding the specification of wafers
SEMI S22-0706b (delayed revision)
P02200 - SEMI P22 - フォトマスク欠陥の分類とサイズ定義についてのガイドライン Revision:SEMI P22-0307 - Inactive to be used for theNOTICE: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI SEMI CurrentInactiveInactiveSEMI Referenced SEMI Standards (purchase separately) None.