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SEMI E4-0997 (technical revision)
SEMI M61-0612 (Reapproved 0319)
this Practice treats the x-y-z (or r-q-z) system separately from the surface coordinate system
3 — Specification for 150 mm (6 inch) Port for Standard Mechanical Interface (SMIF)
(2) increase the void-free denuded zone depth and the bulk micro-defect density after annealing in hydrogen or argon
F06100 - SEMI F61 - Guide to Design and Operation of a Semiconductor Ultrapure Water System Revision:SEMI F61-0521 - Current SEMI E4-0997 (technical revision)This Guide should be used in conjunction with SEMI F63 and SEMI F75. Together these Guides provide recommendations for facility engineers and other manufacturing professionals who are responsible for establishing programs to monitor and control the quality of their ultrapure water (UPW) systems through to point of use (POU). This Guide describes the engineering and component requirements for a UPW system used in semiconductor manufacturing. It is
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